POLISHING METHOD AND POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device to provide high flatness of even a glass panel dimensioned such that a ratio of a size in an diagonal direction to the effective width of a platen is 80% or more. SOLUTION: In this device, a plurality of abrasive feed holes 1c are situated in a dispersing state in a peripheral direction in the surface 1a, making contact with a glass panel, of an upper platen 1 and the positions of the abrasive feed holes 1c adjoining each other in a peripheral direction and a position in a radial direction are situated different from each other. This polishing method is such that the glass panel is nipped between the upper and lower platens to rotate a carrier held in a fit-in state in a holding hole, and the surface of the glass panel is polished by revolving in a rotating state the carrier as abrasive is fed in a gap between the upper platen 1 and the lower platen through a plurality of the abrasive feed holes 1c formed in the upper platen 1.