| 摘要 |
PROBLEM TO BE SOLVED: To effectively eliminate influence of impurity components, such as the particles, alkaline component, etc., and the variations in the environment, such as the temperature, humidity, etc., on processing. SOLUTION: A resist coating, developing, and processing apparatus is provided with a cassette station 10, a processing station 11, and air flow forming mechanisms 60 and 80, which form an air flow from the top side to the bottom side of an interface section 12. The apparatus is also provided with a controller 90 which controls the mechanisms 60 and 80. The processing station 11 has vent holes 56 and 57, respectively communicating with the cassette station 10 and interface section 12, and the controller 90 forms air flows from the processing station 11 to the cassette station 10 and interface section 12 by controlling the air flow forming mechanism 60, so that the pressure in the processing station 11 becomes higher than those in the cassette station 11 and interface section 12. |
