| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus for measuring an X-ray capable of simply measuring the X-ray at a thin film manufacturing site and having general purpose properties in combination with a various type thin film growth furnace. SOLUTION: An X-ray incident window 11 and an X-ray taking-out window 12 are previously formed, and an X-ray radiating unit 20 and an X-ray detecting unit 30 are disposed around a chamber 10 having a sample disposing part 13a therein. The unit 20 has an incident side support means having a base 21, a slide board 22, a supporting pole 23, a rotary board 24 and supporting arms 25, and an X-ray radiating means having an X-ray source 26 supported by the support means including a curved crystal monochromator 27 and an incident slit 28. The unit 30 has a photodetecting side support means having a base 31, a slide board 32, a supporting pole 33 and a rotary board 34, and an X-ray detector 35 (X-ray detecting means).</p> |
