| 发明名称 |
MASK SUBSTRATE FOR EXPOSURE AND EXPOSING DEVICE USING THE SAME |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To accurately read-out a bar code pattern formed on a mask without being restricted by a mechanism. SOLUTION: A covering material 16 such as a white sheet is provided directly on the bar code pattern 15 of a mask substrate 11 for exposure.</p> |
| 申请公布号 |
JP2001092110(A) |
申请公布日期 |
2001.04.06 |
| 申请号 |
JP19990267990 |
申请日期 |
1999.09.22 |
| 申请人 |
NIKON CORP |
发明人 |
OTA TOSHIYA |
| 分类号 |
H01L21/027;G03F1/38;G03F7/22;(IPC1-7):G03F1/08 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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