| 摘要 |
<p>A stage device (4) comprises a support (8) isolated from a surface plate (3) in terms of vibration, and a reaction stage (17) that is allowed to move on the support (8) in one direction by the reaction force exerted when the stage body (2) is driven. Since yawing due to the reaction is eliminated, the setting time decreases and thus throughput improves. In addition, residual vibration is prevented from propagating from the support to the surface plate.</p> |
