发明名称 |
METHOD FOR MANUFACTURING SMCO GROUP HARD MAGNETIC THIN FILM |
摘要 |
PURPOSE: A method for manufacturing an SmCo group hard magnetic thin film is provided to manufacture the SmCo group thin film by controlling a process parameter appositely using a laser ablation process for manufacturing a thin film by irradiating an excimer laser beam to a target fixed in a reaction room. CONSTITUTION: In a method for manufacturing an SmCo group hard magnetic thin film, an SmCo group target consisted of Sm100-xCox(%) is fixed in a vaccum state of a reaction room and a single crystal Si substrate is heated. A pulse width of a fixed Q mode in Nd-YAG laser beam is set as 100-250 microsecond by prolonging an oscillation time optically after rotating the SmCo group target and the Si substrate. The Nd-YAG laser beam is irradiated on the target to form the SmCo group thin film on the substrate.
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申请公布号 |
KR20010037125(A) |
申请公布日期 |
2001.05.07 |
申请号 |
KR19990044457 |
申请日期 |
1999.10.14 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY;POHANG RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE &TECHNOLOGY |
发明人 |
KIM, SANG WON;YANG, CHUNG JIN |
分类号 |
H01S5/30;(IPC1-7):H01S5/30 |
主分类号 |
H01S5/30 |
代理机构 |
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主权项 |
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地址 |
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