发明名称 METHOD FOR MANUFACTURING SMCO GROUP HARD MAGNETIC THIN FILM
摘要 PURPOSE: A method for manufacturing an SmCo group hard magnetic thin film is provided to manufacture the SmCo group thin film by controlling a process parameter appositely using a laser ablation process for manufacturing a thin film by irradiating an excimer laser beam to a target fixed in a reaction room. CONSTITUTION: In a method for manufacturing an SmCo group hard magnetic thin film, an SmCo group target consisted of Sm100-xCox(%) is fixed in a vaccum state of a reaction room and a single crystal Si substrate is heated. A pulse width of a fixed Q mode in Nd-YAG laser beam is set as 100-250 microsecond by prolonging an oscillation time optically after rotating the SmCo group target and the Si substrate. The Nd-YAG laser beam is irradiated on the target to form the SmCo group thin film on the substrate.
申请公布号 KR20010037125(A) 申请公布日期 2001.05.07
申请号 KR19990044457 申请日期 1999.10.14
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY;POHANG RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE &TECHNOLOGY 发明人 KIM, SANG WON;YANG, CHUNG JIN
分类号 H01S5/30;(IPC1-7):H01S5/30 主分类号 H01S5/30
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