发明名称 Three-dimensional electrostatic discharge semiconductor device
摘要 Three-dimensional electrostatic discharge (ESD) semiconductor devices are fabricated together with three-dimensional non-ESD semiconductor devices. For example, an ESD diode and FinFET are fabricated on the same bulk semiconductor substrate. A spacer merger technique is used in the ESD portion of a substrate to create double-width fins on which the ESD devices can be made larger to handle more current.
申请公布号 US9455316(B2) 申请公布日期 2016.09.27
申请号 US201514871289 申请日期 2015.09.30
申请人 GLOBALFOUNDRIES INC. 发明人 Singh Jagar;Wei Andy;Natarajan Mahadeva Iyer
分类号 H01L29/06;H01L27/02;H01L21/306;H01L21/308;H01L29/417;H01L29/45;H01L29/861;H01L29/866 主分类号 H01L29/06
代理机构 Heslin Rothenberg Farley & Mesiti P.C. 代理人 Reinke, Esq. Wayne F.;Heslin Rothenberg Farley & Mesiti P.C.
主权项 1. A method, comprising: providing a semiconductor structure, the structure comprising a semiconductor substrate, a blanket layer of a protective material over the semiconductor substrate and a plurality of mandrels over the protective layer; creating merged spacers between the plurality of mandrels; removing the mandrels; etching to reduce a height of the merged spacers; etching the semiconductor substrate using the reduced height spacers as a hard mask to create raised semiconductor structures having a width at least equal to the merged spacers; and creating one or more ESD semiconductor devices at a top portion of at least one of the raised structures.
地址 Grand Cayman KY