发明名称 |
Three-dimensional electrostatic discharge semiconductor device |
摘要 |
Three-dimensional electrostatic discharge (ESD) semiconductor devices are fabricated together with three-dimensional non-ESD semiconductor devices. For example, an ESD diode and FinFET are fabricated on the same bulk semiconductor substrate. A spacer merger technique is used in the ESD portion of a substrate to create double-width fins on which the ESD devices can be made larger to handle more current. |
申请公布号 |
US9455316(B2) |
申请公布日期 |
2016.09.27 |
申请号 |
US201514871289 |
申请日期 |
2015.09.30 |
申请人 |
GLOBALFOUNDRIES INC. |
发明人 |
Singh Jagar;Wei Andy;Natarajan Mahadeva Iyer |
分类号 |
H01L29/06;H01L27/02;H01L21/306;H01L21/308;H01L29/417;H01L29/45;H01L29/861;H01L29/866 |
主分类号 |
H01L29/06 |
代理机构 |
Heslin Rothenberg Farley & Mesiti P.C. |
代理人 |
Reinke, Esq. Wayne F.;Heslin Rothenberg Farley & Mesiti P.C. |
主权项 |
1. A method, comprising:
providing a semiconductor structure, the structure comprising a semiconductor substrate, a blanket layer of a protective material over the semiconductor substrate and a plurality of mandrels over the protective layer; creating merged spacers between the plurality of mandrels; removing the mandrels; etching to reduce a height of the merged spacers; etching the semiconductor substrate using the reduced height spacers as a hard mask to create raised semiconductor structures having a width at least equal to the merged spacers; and creating one or more ESD semiconductor devices at a top portion of at least one of the raised structures. |
地址 |
Grand Cayman KY |