发明名称 |
THERMAL PLATE WITH PLANAR THERMAL ZONES FOR SEMICONDUCTOR PROCESSING |
摘要 |
A thermal plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar thermal zones arranged in a scalable multiplexing layout, and electronics to independently control and power the planar heater zones. Each planar thermal zone uses at least one Peltier device as a thermoelectric element. A substrate support assembly in which the thermal plate is incorporated includes an electrostatic clamping electrode layer and a temperature controlled base plate. Methods for manufacturing the thermal plate include bonding together ceramic or polymer sheets having planar thermal zones, positive, negative and common lines and vias. |
申请公布号 |
SG10201605905T(A) |
申请公布日期 |
2016.09.29 |
申请号 |
SGT10201605905 |
申请日期 |
2012.09.17 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
GAFF, KEITH, WILLIAM;COMENDANT, KEITH;RICCI, ANTHONY |
分类号 |
|
主分类号 |
|
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|