发明名称 METHOD FOR IRRADIATING ELECTRON BEAM
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for irradiating electron beams generating no bubbles in deformed and swelled areas by solving problems that bubbles, swelled areas and deformed areas are generated as decomposed gas is occluded in a film when a multi-layered structure in which the both sides of the base material are coated with films is irradiated with electron beams. SOLUTION: A division number N and a lay-up time T is determined to satisfy the following relation: 2.32×10-2 mGML<TKAN, wherein m is the mass of a base material; G is the G value (number of gas molecules generated by 100eV energy) of the base material; M (Mrad) is the whole amount of irradiation; N is the division number of the irradiation; A is the area of a coating film; L is the thickness of the coating film; K is the diffusion constant of the film.</p>
申请公布号 JP2001164008(A) 申请公布日期 2001.06.19
申请号 JP19990350975 申请日期 1999.12.10
申请人 NISSIN HIGH VOLTAGE CO LTD 发明人 HOSHI YASUHISA;OKAZAKI TAIZO;NAKAI KOJI
分类号 C08J7/00;B32B43/00;G21K5/04;(IPC1-7):C08J7/00 主分类号 C08J7/00
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