HALFTONE PHASE SHIFT MASK AND BLANK

摘要

PROBLEM TO BE SOLVED: To provide a halftone phase shift mask having a single layer film or multilayered film containing metals and silicon as the main structural elements on a glass substrate in such a manner that the latitude for the optical constants used for designing the film is large, that minute defects are hardly caused in the film after the film is formed and that the film has resistance against laser light. SOLUTION: The shift mask has a region containing a metal silicide produced by coupling a metal and silicon as the main structural element in the substances constituting the single layer film or multilayered film, and at least one of the metal not silicified and silicon not forming a compound with metal elements is incorporated into the aforementioned region.