| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high sensitivity positive type radiation sensitive composition having such resolution as to attain sub-quarter-micron patterning. SOLUTION: The positive type radiation sensitive composition contains a polymer containing a structural unit of formula 1 (where X is fluorine-containing alkyl; and A is a monovalent organic group having tertiary carbon combined to oxygen and containing an aromatic ring) and an acid generating agent which generates an acid when irradiated. |
