发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity, plating bath contaminating property, developability and mechanical strength. SOLUTION: In the photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule and (C) a photopolymerization initiator, a compound of formula I (where each of four symbols R is a 1-6C alkyl and each of four symbols Z is a halogen atom) is contained as an essential component as the component C.
申请公布号 JP2001222104(A) 申请公布日期 2001.08.17
申请号 JP20000035646 申请日期 2000.02.08
申请人 HITACHI CHEM CO LTD;HODOGAYA CHEM CO LTD 发明人 HIDAKA TAKAHIRO;NATORI MICHIKO;MURAKAMI TAIJI
分类号 G03F7/029;G03F7/027;G03F7/032;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/029
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