| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and device for manufacturing thin film which are contrived to improve the productivity of a thin film by shortening useless time not contributing to the formation of the thin film. SOLUTION: This thin film manufacturing device is provided with film forming chambers 84 and 85 provided in a common chamber 81, gas supplying systems respectively connected to the chambers 84 and 85 through stop valves A 70, and vacuum evacuation systems for film forming chamber connected to the chambers 84 and 85 through stop valves B 101. This device is also provided with a vacuum evacuation system for common chamber connected to the common chamber 81 through a stop valve C and pressure control valves 103 provided between the chambers 84 and 85 and valves B. Branch gas supplying pipes 100 having stop valves D 71 are respectively connected between the valves B and vacuum evacuation systems for film forming chamber and, at the time of forming the thin film, a gas is made to flow in advance to the vacuum evacuation system sides by starting gas supply while substrates are transported and, when the transportation of the substrates ends, the film forming chambers 84 and 85 are formed and film formation is started by switching the gas from the vacuum evacuation system sides to the film chambers 84 and 85 sides. Consequently, the gas mixing ratio is stabilized and the time other than the film forming time is shortened.</p> |
