发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1, formula 2 or the like. |
申请公布号 |
JP2001235864(A) |
申请公布日期 |
2001.08.31 |
申请号 |
JP20000046031 |
申请日期 |
2000.02.23 |
申请人 |
JSR CORP |
发明人 |
DOUKI KATSUJI;YAMAHARA NOBORU;KAJITA TORU;SHIMOKAWA TSUTOMU |
分类号 |
G03F7/039;C08K5/00;C08K5/12;C08L45/00;C08L101/02;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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