发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1, formula 2 or the like.
申请公布号 JP2001235864(A) 申请公布日期 2001.08.31
申请号 JP20000046031 申请日期 2000.02.23
申请人 JSR CORP 发明人 DOUKI KATSUJI;YAMAHARA NOBORU;KAJITA TORU;SHIMOKAWA TSUTOMU
分类号 G03F7/039;C08K5/00;C08K5/12;C08L45/00;C08L101/02;G03F7/004;H01L21/027 主分类号 G03F7/039
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