| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that an efficient method for depositing a photocatalytic film having high photocatalytic activity onto a base material of large area by a sputtering method has not yet been developed and a high- activity photocatalytic film cannot be obtained. SOLUTION: The article is manufactured by coating a glass plate with a photocatalytic film deposited by a sputtering method. The photocatalytic film contains, based on titanium oxide as a principal component, 0.01-10 wt.%, in total on the basis of metal, of at least one metal having a sputtering yield per ion of Ar 0.9 to 2.7 times that of Ti, preferably at least one metal selected from the metal group consisting of Fe, V, Mo, Nb, Al and Cr. This film is deposited on the base material by the following methods: (1) a method where film deposition is performed using a Ti-metal or Ti-suboxide sputtering target containing the above metal in an amount of 0.01-10 wt.% in total on the basis of metal; (2) a method where film deposition is performed using two sputtering targets to which inverted electric potential is applied so that an anode and a cathode are alternately formed. |
