发明名称 COMPOSITION OF POSITIVE PHOTORESIST
摘要 PROBLEM TO BE SOLVED: To provide a new tetra(hydroxyphenyl)alkane derivative and the application that increase photosensitivity and/or development speed for photoresist. SOLUTION: An ester of 1,2(or 2,1)-naphthoquinonediazide-4-(or 5-)sulfonic acid and a compound of formula (I) is provided. This compound is used as the photoactive component of the composition of positive photoresist. [Each of R shows H, a 1-4C alkyl group 1-4C alkoxy group,-OCH2C6H5 group, -OC6H5 group or -COO-(1-4C) alkyl group, R1 and R2 show each H, a 1-4C alkyl group, -C6H5 group or alicyclic 5 or 6-membered ring independently mutually, a shows the integer of 0 to 4, m and n show each the integer of 0 to 2 independently].
申请公布号 JP2001240589(A) 申请公布日期 2001.09.04
申请号 JP20010014513 申请日期 2001.01.23
申请人 OLIN MICROELECTRONIC CHEMICALS INC 发明人 SCHULZ REINHARD DR;MUENZEL NORBERT;ROTH MARTIN;KNOBLOCH WILHELM
分类号 G03F7/004;C07C39/15;C07C309/71;C07C309/76;C08K5/42;C08L101/00;G03F7/022;H01L21/027;H05K3/00 主分类号 G03F7/004
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