摘要 |
<p>PROBLEM TO BE SOLVED: To provide a dispersing agent for abrasive grain for polishing and a slurry for polishing, improved in abrasive rate and effect for preventing occurrence of fine flaws. SOLUTION: This slurry for polishing comprises the dispersing agent for abrasive grain, composed of a non-alkylphenol type polyether compound and an inorganic rust preventing agent, in which surface tension of 1% aqueous solution at 25 deg.C is 20 to 40 dyne/cm and disperse stability of abrasive grain is >=1.3 times compared with a case when only water is used, abrasive grain and water.</p> |