发明名称 DISPERSING AGENT FOR ABRASIVE GRAIN FOR POLISHING AND SLURRY FOR POLISHING
摘要 <p>PROBLEM TO BE SOLVED: To provide a dispersing agent for abrasive grain for polishing and a slurry for polishing, improved in abrasive rate and effect for preventing occurrence of fine flaws. SOLUTION: This slurry for polishing comprises the dispersing agent for abrasive grain, composed of a non-alkylphenol type polyether compound and an inorganic rust preventing agent, in which surface tension of 1% aqueous solution at 25 deg.C is 20 to 40 dyne/cm and disperse stability of abrasive grain is >=1.3 times compared with a case when only water is used, abrasive grain and water.</p>
申请公布号 JP2001240850(A) 申请公布日期 2001.09.04
申请号 JP20000054616 申请日期 2000.02.29
申请人 SANYO CHEM IND LTD 发明人 YAMAGUCHI TAKESUKE;YAMADA YASUHIRO
分类号 B01F17/42;B24B37/00;C08K3/00;C08K3/32;C08K3/34;C08K5/05;C08L71/00;C08L71/02;C08L75/08;C08L101/16;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 主分类号 B01F17/42
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