| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type etching resist composition excellent in operation stability and having high sensitivity and good conductor image forming property. SOLUTION: The positive type photosensitive resin composition contains a photosensitive acrylic resin (A) having a photosensitive group of formula 1 (where X is a group of formula 2 or 3; R1 is alkyl, cycloalkyl or alkyl ether; and R2 is alkylene containing a 1-12C linear, branched or cyclic hydrocarbon) at a concentration of 0.1-1.0 mol per 1 kg resin and having a number average molecular weight of 6,000-100,000 and a water-soluble or water-dispersible acrylic resin composition (B) having a salt forming group. |
