发明名称 |
Functional films, their use, articles having the films and processes for producing these |
摘要 |
A functional film at least one surface of which has at least one of characteristics that (1) the surface has an unevenness that its surface roughness is from 10 A to 500 A as RMS value; (2) the surface has an unevenness whose pitch has an average value not larger than the RMS value of surface roughness; and (3) the surface comprises an oxide of an inorganic element (represented by M), and the value of [number of carbon atoms]/[number of M atoms] at the surface is 0.1 or less; an article having such a film; and processes for producing these are provided in the present invention.
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申请公布号 |
US2001026859(A1) |
申请公布日期 |
2001.10.04 |
申请号 |
US20000725198 |
申请日期 |
2000.11.29 |
申请人 |
NAKAMURA TORU;MIYAKAWA AKIKO;SUZUKI MASAHITO;OOHASHI KAZUTOSHI;NAKAGIRI NOBUYUKI;FUKASAWA RYOICHI |
发明人 |
NAKAMURA TORU;MIYAKAWA AKIKO;SUZUKI MASAHITO;OOHASHI KAZUTOSHI;NAKAGIRI NOBUYUKI;FUKASAWA RYOICHI |
分类号 |
B32B9/00;G02B1/10;(IPC1-7):B32B1/00 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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