发明名称 Flow control of process gas in semiconductor manufacturing
摘要 A flow control system (10) for controlling batchwise delivery of process gas (12) for semiconductor manufacturing are disclosed, wherein the flow control system (10) is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. <IMAGE> <IMAGE>
申请公布号 AU4162901(A) 申请公布日期 2001.10.08
申请号 AU20010041629 申请日期 2001.02.22
申请人 PARKER-HANNIFIN CORPORATION 发明人 LOUIS OLLIVIER
分类号 C23C16/455;G05D7/06;G05D16/06;H01L21/205 主分类号 C23C16/455
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