发明名称 |
Apparatus for removing impurities from effluent waste gas streams |
摘要 |
An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
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申请公布号 |
US2001051123(A1) |
申请公布日期 |
2001.12.13 |
申请号 |
US20010931610 |
申请日期 |
2001.08.16 |
申请人 |
WINBOND ELECTONICS CORP. |
发明人 |
WANG C.C.;SUN L.K.;WEN JEFFREY |
分类号 |
B01D53/18;B01D53/26;(IPC1-7):C01B7/00;B01D53/68 |
主分类号 |
B01D53/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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