发明名称 Monolithically integrated electronic device and fabrication process therefor
摘要 An electronic device, integrated monolithically in a semiconductor substrate and comprising a bipolar transistor connected in series to at least one MOS transistor, the bipolar transistor having a base region that includes a first buried region and a first diffused region extending continuously from the substrate surface down to the buried region, and the diffused region is bordered by an isolation trench region extending in the buried region.
申请公布号 US2001050412(A1) 申请公布日期 2001.12.13
申请号 US20010823915 申请日期 2001.03.30
申请人 PATTI DAVIDE 发明人 PATTI DAVIDE
分类号 H01L27/07;(IPC1-7):H01L27/082 主分类号 H01L27/07
代理机构 代理人
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