| 摘要 |
PROBLEM TO BE SOLVED: To stably form a groove finer than the spot diameter of an exposure beam by a simple process. SOLUTION: A base layer 2 made of a water-soluble resin, intermediate layer 3 made of conductive material and a photoresist layer 4 are laminated on a glass substrate 1, the photoresist layer 4 is exposed to laser beams and developed to form a groove pattern. The groove pattern is used as a mask to etch the intermediate layer 3 to form the groove pattern in the intermediate layer. Thus, the groove pattern having width narrower than the spot diameter of the exposure beam to expose the photoresist layer 4 is formed with good accuracy in the intermediate layer 3. |
