| 摘要 |
PURPOSE: An illumination system is provided to optimize the performance of a photolithographic system, and in particular to reduce line width variations, and to compensate for certain imperfections in the optics of a photolithographic tool that affect line width. CONSTITUTION: A relatively uniform illumination intensity profile(24) is projected through the optical element(14). The optical element(14) then creates an illumination field or plane at or adjacent to the reticle(16). The illumination plane formed at reticle(16) projects the image of the reticle(16) onto a photosensitive resist covered substrate or wafer. Electromagnetic radiation represented by lines(15) illustrate the different illumination properties, such as numerical aperture, fill geometry, partial coherence or fill geometry, and others, provided over a region of the reticle by the optical element(14). Electromagnetic radiation represented by lines(17) illustrate other, different illumination properties than those represented by lines(15).
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