发明名称 Methods of forming field effect transistors and field effect transistor circuitry
摘要 Methods of forming field effect transistors and resultant field effect transistor circuitry are described. In one embodiment, a semiconductive substrate includes a field effect transistor having a body. A first resistive element is received by the substrate and connected between the transistor's gate and the body. A second resistive element is received by the substrate and connected between the body and a reference voltage node. The first and second resistive elements form a voltage divider which is configured to selectively change threshold voltages of the field effect transistor with state changes in the gate voltage. In a preferred embodiment, first and second diode assemblies are positioned over the substrate and connected between the gate and body, and the body and a reference voltage node to provide the voltage divider.
申请公布号 US2002017678(A1) 申请公布日期 2002.02.14
申请号 US20010956171 申请日期 2001.09.18
申请人 GONZALEZ FERNANDO;MOULI CHANDRA 发明人 GONZALEZ FERNANDO;MOULI CHANDRA
分类号 H01L27/07;(IPC1-7):H01L29/76 主分类号 H01L27/07
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