| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflective coating organic composition enabling a specified polymer to form for an antireflective film in a hyperfine pattern- forming process and capable of forming the stable hyperfine pattern in a high yield, by preventing reflection of the light by an inner film layer on a wafer, by removing standing waves caused by unevenness in thickness of a photoresist and by removing critical dimensional(CD) fluctuation caused by the diffracted or reflected light, and to provide a method for producing the antireflective film capable of freely controlling a k-value which is difficult to be controlled in conventional films. SOLUTION: This antireflective coating composition contains the organic antireflective polymer which is given by using a compound expressed by the general formula (1) (R is H or methyl; Ra, Rb and R1 to R9 are each -H, -OH, -OCOCH3, -COOH, -CH2OH, -H, a 1-5C linear or branched alkyl which may be substituted or not substituted, a 1-5C linear or branched alkoxyalkyl which may be substituted or not substituted; and n is 1-5). The method for producing the antireflective film comprises utilizing the antireflective coating composition. |
