发明名称 |
FINE PATTERN FORMING APPARATUS, METHOD FOR MANUFACTURING FINE NOZZLE AND METHOD FOR FORMING FINE PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a fine pattern forming apparatus capable of forming a fine pattern with high-precision by direct drawing with ink, a method for manufacturing a fine nozzle which such fine pattern forming apparatus is equipped with, and a method for forming a fine pattern. SOLUTION: A silicon substrate 2 which is equipped with a plurality of fine holes which penetrate through the fine pattern forming apparatus from its front surface to its rear surface and have a silicon dioxide layer 4 on their walls is provided. Fine nozzles 5 which protrude from the rear surface of the silicon substrate through openings 3a of the fine holes integrally with the silicon dioxide layer, a silicon nitride 6 formed on the front surface 2A and the sides 2C of the silicone substrate, a supporting member 7 arranged on the front surface side of the silicon substrate, an ink flow passage 8 to supply ink to the openings of the fine holes on the front surface side of the silicon substrate, and an ink supplying apparatus 9 connected to the ink flow passage are also provided. |
申请公布号 |
JP2002096474(A) |
申请公布日期 |
2002.04.02 |
申请号 |
JP20010010188 |
申请日期 |
2001.01.18 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
FUJITA HIROYUKI;MITA YOSHIRO;DAITO RYOICHI;TSUCHIYA KATSUNORI |
分类号 |
B41J2/135;B05B1/14;B05B5/025;B05C5/00;B05C5/02;B05C11/10;B05D1/04;B05D1/26;B41J2/02;G02B5/20;G02F1/1335;G02F1/1345;H01L21/027;H01L51/00;H01L51/40 |
主分类号 |
B41J2/135 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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