IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

摘要

An imprint apparatus which transfers a pattern of a mold onto a substrate is provided. The imprint apparatus includes a plurality of gas supply units each supplying a gas for substituting for air in the space between an original and the substrate. A control unit of the imprint apparatus controls the gas flow rate from each gas supply unit in accordance with the area of a portion where the original and the substrate overlap in a plan view after relatively moving the original and the substrate such that a target shot region on the substrate is positioned immediately under the pattern surface of the original.

主权项

1. An imprint apparatus which transfers a pattern of an original onto a substrate, the apparatus comprising:
a plurality of gas supply units each configured to supply a gas for substituting for air in a space between the original and the substrate; and a control unit configured to control a gas flow rate from each of the plurality of gas supply units in accordance with an area of a portion where the original and the substrate overlap in a plan view after relatively moving the original and the substrate such that a target shot region on the substrate is positioned under a pattern surface of the original.