| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist resin which can form a fine pattern with excellent homogeneity and high resolution. SOLUTION: The polymer to be used for the photoresist resin contains at least one kind of monomer unit expressed by formula (I). In the formula, Ra is a hydrogen atom or methyl group, Rb represents one or more substituents which may be same or different and each Rb is a hydrogen atom, methyl group, hydroxyl group which may have protecting groups, carboxyl group which may have protecting groups or oxo group and R1 is a 1-8C straight chain, branched or cyclic hydrocarbon group. |
