发明名称 |
Electrical contact for high dielectric constant capacitors and method for fabricating the same |
摘要 |
An electrical contact includes a non-conductive spacer surrounding conductive plug material along the full height of the contact. The spacer inhibits oxide and other diffusion through the contact. In the illustrated embodiment, the contact includes metals or metal oxides which are resistant to oxidation, and additional conductive barrier layers. The contact is particularly useful in integrated circuits which include high dielectric constant materials.
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申请公布号 |
US2002079581(A1) |
申请公布日期 |
2002.06.27 |
申请号 |
US20010015811 |
申请日期 |
2001.11.02 |
申请人 |
GRAETTINGER THOMAS M.;GEALY F. DANIEL |
发明人 |
GRAETTINGER THOMAS M.;GEALY F. DANIEL |
分类号 |
H01L21/02;H01L21/285;H01L21/60;H01L21/768;H01L21/8242;H01L23/485;(IPC1-7):H01L23/48;H01L23/52 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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