发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING INSULATING FILM AND INSULATING FILM FOR ORGANIC ELECTROLUMINESCENT ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition giving an insulating film widen toward the bottom and suitable for use as an insulating film for an organic EL element and to provide an insulating film for an organic EL element. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble resin, (B) a quinonediazidosulfonic ester, (C) an organic solvent and (D) a thermosetting component. The insulating film for an organic EL element widen toward the bottom and having 0.3-3 μm thickness is obtained by forming a resin film having a desired pattern with the resin composition and curing the resin film by heating. |
申请公布号 |
JP2002189290(A) |
申请公布日期 |
2002.07.05 |
申请号 |
JP20010300132 |
申请日期 |
2001.09.28 |
申请人 |
NIPPON ZEON CO LTD |
发明人 |
KASHIWAGI MOTOFUMI;MITAO TOKUYUKI;ABE NOBUNORI |
分类号 |
G03F7/004;C08F2/44;C08F2/50;C08F291/00;G03F7/022;G03F7/40;H01L51/50;H05B33/14;H05B33/22 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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