PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a new negative type photosensitive resin composition developable with a dilute alkali solution and capable of supplying a high sensitivity and high resolution resist pattern. SOLUTION: The photosensitive resin composition contains at least an alkali- soluble resin (A), a polymerizable monomer (B) and a photopolymerization initiator (C) and the alkali-soluble resin (A) is a polymer containing modified (hydroxystyrene) into which an ethylenically unsaturated group has been introduced as a structural unit.