摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask stamper that can increase efficiency in mask manufacture, and at the same time can improve the machining accuracy of a pattern, and to provide a mask, the method of manufacturing the mask, and the method of manufacturing a semiconductor device. SOLUTION: This method of manufacturing the mask includes a process for forming a thin film 114 on one surface of a substrate, a process for forming a protection layer 112 on the thin film 114, a process for removing one portion of the substrate from the other side of the substrate for locally exposing the thin film 114, a process for providing a permeation section 107 where an electromagnetic wave with a specific wavelength permeates and a shielding section 103 where the electromagnetic wave is shielded at the exposed section of the thin film 114, and a process for removing a protection layer 112. The mask stamper and the mask are formed by the manufacturing method. The method of manufacturing the semiconductor device uses them.</p> |