发明名称 MASK STAMPER, MASK AND ITS MANUFACTURING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a mask stamper that can increase efficiency in mask manufacture, and at the same time can improve the machining accuracy of a pattern, and to provide a mask, the method of manufacturing the mask, and the method of manufacturing a semiconductor device. SOLUTION: This method of manufacturing the mask includes a process for forming a thin film 114 on one surface of a substrate, a process for forming a protection layer 112 on the thin film 114, a process for removing one portion of the substrate from the other side of the substrate for locally exposing the thin film 114, a process for providing a permeation section 107 where an electromagnetic wave with a specific wavelength permeates and a shielding section 103 where the electromagnetic wave is shielded at the exposed section of the thin film 114, and a process for removing a protection layer 112. The mask stamper and the mask are formed by the manufacturing method. The method of manufacturing the semiconductor device uses them.</p>
申请公布号 JP2002231599(A) 申请公布日期 2002.08.16
申请号 JP20010020750 申请日期 2001.01.29
申请人 SONY CORP 发明人 YOSHIZAWA MASAKI
分类号 G03F1/20;G03F1/22;G03F1/24;H01L21/027;H01L21/302;H01L21/3065;(IPC1-7):H01L21/027;H01L21/306;G03F1/16 主分类号 G03F1/20
代理机构 代理人
主权项
地址