发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS HAVING ULTRASONIC GENERATOR
摘要 PURPOSE: A semiconductor manufacturing apparatus having an ultrasonic generator is provided to prevent a power adsorption by generating an ultrasonic wave. CONSTITUTION: A semiconductor manufacturing apparatus comprises a process tube(200), a chamber(220), a pipe(230), a pump(240) for making the pipe(230) a vacuum state, a gas injection pipe(210) for supplying a reactive gas to the chamber(220) of the process tube(200) and a main valve(260) for controlling the pressure of the inner space of the pipe(230). The semiconductor manufacturing apparatus further includes an ultrasonic generator(280) connected with the pipe(230) for generating an ultrasonic wave into the pipe(230) and a controller(290) connected with the ultrasonic generator(280) for automatically controlling the frequency of the ultrasonic wave.
申请公布号 KR20020072373(A) 申请公布日期 2002.09.14
申请号 KR20010012250 申请日期 2001.03.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, GYE HONG;CHOI, U GYEONG;KO, SANG GUK;SEO, DAE MAN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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