METHOD FOR PRODUCING PHASE SHIFT PHOTOMASK AND BLANK FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a phase shift photomask having a high-precision perpendicular processed section to which physical cleaning generally used for photomask cleaning can be applied as it is and blanks for the phase shift photomask. SOLUTION: The phase shift photomask has a transparent region 5 and a region of a translucent layer 4 on a transparent substrate 1, when the transmittance of the region 5 transparent to the wavelength of light for exposure in transfer is considered to be 100%, the transmittance of the region of the translucent layer 4 is 3-35%, and the region of the translucent layer 4 shifts the phase of the wavelength of light for exposure substantially by 180 deg. with respect to the transparent region. In the method for producing the phase shift photomask, the translucent layer 4 is formed by successively depositing monolayer translucent layers 2, 3 from chromium compounds having the same composition by the same physical vapor growth method.