| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for reducing the discharge of perfluoro base compounds in a semiconductor manufacturing process consisting of a number of sub-processes. SOLUTION: In the semiconductor manufacturing process consisting of a plurality of sub-processes generating at least one perfluoro base compound, the perfluoro base compounds generated by performing the respective sub- processes are discharged to common lines 22a, 22b, 22c, 22d to produce mixed discharge gas flows, and the mixed discharge gas flows discharged from the respective sub-processes are treated by using individual perfluoro base compounds cleaning systems 24a, 24b, 24c, 24d and are mixed to produce a mixed treated gas flow, and then the above mixed treated gas flow is subjected to wet scrubbing.</p> |
