| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve such weak points of the conventional method for purging the contents of a vessel such as a glove box that a large quantity of the gas to be purged is consumed, it takes a long time and it costs too much to purge the contents and the operation is complicated. SOLUTION: Substance-permeable screens are arranged on both or one of the side faces of the upstream and downstream ends of a purge gas stream in the glove box or the other vessels. A purge gas introducing port is arranged in a wafer conveying/storing vessel for supplying the purge gas. As a result, the floating particulates or gaseous molecules in the vessel can be purged in a short time while the consumption of the purge gas is restrained. High- performance purge gas environment can be created without using the expensive evacuating glove box whose operation is complicated. Clean environment far cleaner than the conventional super clean environment can be created though the screen-arranged vessel is inexpensive and the product yield can be enhanced extremely at the step to manufacture a semiconductor device.</p> |
