发明名称 |
PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor composition having high sensitivity, a high yield of a residual film and high resolution. SOLUTION: The photosensitive polyimide precursor composition has (a) a polyimide precursor having carbon-carbon double bonds dimerizable or polymerizable with actinic radiation, (b) an aromatic nitroso compound having one or more phenolic hydroxyl groups represented by the formula ON-R<1> -(OH)p (where R<1> is a 1-30C organic group containing one or more aromatic rings, the hydroxyl and nitroso groups bond directly to the aromatic rings and (p) is an integer of 1-3) and (c) a titanocene compound. |
申请公布号 |
JP2002296767(A) |
申请公布日期 |
2002.10.09 |
申请号 |
JP20010095157 |
申请日期 |
2001.03.29 |
申请人 |
TORAY IND INC |
发明人 |
YUMIBA TOMOYUKI;IKEDA TAKANOBU;TOMIKAWA MASAO |
分类号 |
G03F7/004;C08F290/14;C08K5/28;C08K5/32;C08K5/56;C08L79/08;G03F7/008;G03F7/029;G03F7/038;H01L21/027;H01L21/312 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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