发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor composition having high sensitivity, a high yield of a residual film and high resolution. SOLUTION: The photosensitive polyimide precursor composition has (a) a polyimide precursor having carbon-carbon double bonds dimerizable or polymerizable with actinic radiation, (b) an aromatic nitroso compound having one or more phenolic hydroxyl groups represented by the formula ON-R<1> -(OH)p (where R<1> is a 1-30C organic group containing one or more aromatic rings, the hydroxyl and nitroso groups bond directly to the aromatic rings and (p) is an integer of 1-3) and (c) a titanocene compound.
申请公布号 JP2002296767(A) 申请公布日期 2002.10.09
申请号 JP20010095157 申请日期 2001.03.29
申请人 TORAY IND INC 发明人 YUMIBA TOMOYUKI;IKEDA TAKANOBU;TOMIKAWA MASAO
分类号 G03F7/004;C08F290/14;C08K5/28;C08K5/32;C08K5/56;C08L79/08;G03F7/008;G03F7/029;G03F7/038;H01L21/027;H01L21/312 主分类号 G03F7/004
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