METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a wafer carriage system for a semiconductor manufacturing line which copes with to 300 mm wafers. SOLUTION: The carriage of a wafer within the bay (a group of devices) of a clean room is performed by RGV(rail guided vehicle) 11 traveling in a straight line at a high speed on a carriage rail 3 laid on the floor of the clean room. The carriage area where the RGV 11 travels is separated from a work region for a person by a partition 4, and is so structured that the person cannot enter the carriage area at operation of the line.