| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a defect correcting method of photomask by which the operability of correction of black defect in a circular transmission pattern is largely improved and the correction almost just as design can be performed in the precision of correction too. SOLUTION: In this defect correcting method of photomask, a laser correcting device which makes a laser beam 11 fair by means of a variable rectangle aperture 14, allows the laser beam which is made fair in a rectangular form to be imaged on a black defect part on the photomask 1 through an imaging lens 15 and removes the black defect is used, a focus of the imaging lens 15 is intentionally deviated, thereby, a rectangular laser beam which passes through the imaging lens forms a laser correcting region which is, for instance, circular or almost circular on the photomask 1 and, in such a manner, the black defect is removed.</p> |
