Method for metallizing textured surfaces

摘要

A method for creating electrically conducting or semiconducting patterns on a textured surface including plural reliefs of amplitude greater than or equal to 100 nanometers, including: preparing a substrate during which at least the textured surface of the substrate is made electrically conducting; coating during which at least one layer of an imprintable material is laid on the textured surface, made electrically conducting, of the substrate; pressing a mold including valleys or protrusions to transfer the valleys or the protrusions of the mold into the imprintable material to form patterns therein; removing the mold while leaving the imprint of the patterns in the imprintable material; exposing the textured surface, made electrically conducting, of the substrate, at a bottom of the patterns; and electrically depositing an electrically conducting or semiconducting material into the patterns to form conducting or semiconducting patterns.

主权项

1. A method for creating electrically conducting or semiconducting patterns on a textured surface, comprising:
providing a substrate having a textured surface formed by a plurality of reliefs of amplitude greater than or equal to 100 nanometers; preparing the substrate to make the whole of the textured surface of the substrate electrically conducting; coating at least one layer of an imprintable material on the textured surface which was made electrically conducting; pressing a mold comprising valleys and protrusions such that the valleys and the protrusions of the mold are transferred into the imprintable material to form patterns therein; removing the mold while leaving an imprint of the patterns in the imprintable material; etching bottom portions of the patterns to expose the textured surface at a bottom of the patterns; and electrically depositing at least an electrically conducting or semiconducting material into the patterns to form conducting or semiconducting patterns on the textured surface.