| 摘要 |
PROBLEM TO BE SOLVED: To obtain a particulate polymeric compound which does not adversely affect resist performance when used as the resin component of a photoresist resin composition. SOLUTION: The particulate photoresist compound polymeric compound is a photoresist polymeric compound which becomes alkali-soluble by the action of an acid, and has a volume average particle diameter in the range of 20-300 μm and, simultaneously, >=90 vol.%, based on the entire particles, particles having a particle diameter of 10-500 μm. This particulate photoresist polymeric compound can be produced by feeding a solution of a photoresist polymeric compound which becomes alkali-soluble by the action of an acid into a poor solvent through a nozzle having a bore diameter of <=6 mmϕ to effect precipitation or reprecipitation. |
