SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To realize the good treatment of a substrate by preventing the stagnation of liquid drops on a member approaching a substrate holding means after the treatment of the substrate to suppress the generation of particles. SOLUTION: A release pawl 70 for releasing the holding of a wafer by a spinning chuck is equipped with an arm part 71 and the pawl part 72 integrally formed to the leading end of the arm part 71. The upper surface of the arm part 71 comprises a pair of inclined surfaces 71a and 71b. A through-hole 74 is formed to the pawl part 72 and the upper surface of the pawl part 72 has downward inclined surfaces 75 inwardly going toward the through-hole 74.