发明名称 |
METHOD AND APPARATUS FOR ADJUSTING CHARACTERISTICS OF ELECTRON SOURCE, AND METHOD FOR MANUFACTURING ELECTRON SOURCE |
摘要 |
PURPOSE: Method and apparatus for adjusting characteristics of electron source, and method for manufacturing electron source are provided to enable the characteristics of a multi-electron source to be almost the same in a simple process by the use of properties peculiar to an electron-emitting device. CONSTITUTION: A method for adjusting characteristics of an electron source having a plurality of electron-emitting devices, the method comprising the step of: applying a pulse of a voltage for adjustment to an electron-emitting device to be adjusted one or more times according to a characteristic of the electron-emitting device; wherein: the voltage for adjustment is selected from a plurality of voltages having discrete values according to the characteristic of the electron-emitting device; and a number of applying times of the pulse is determined according to the characteristic of the electron-emitting device and the selected voltage.
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申请公布号 |
KR20030014129(A) |
申请公布日期 |
2003.02.15 |
申请号 |
KR20020046281 |
申请日期 |
2002.08.06 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
AOKI SHUJI;OGUCHI TAKAHIRO |
分类号 |
G09G3/20;G09G3/22;H01J9/42;(IPC1-7):G09G3/20 |
主分类号 |
G09G3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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