| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a quantitative analysis method using the mapping data which extracts only a targeted analysis area to obtain the mean concentration of elements in the analysis area with high accuracy. SOLUTION: In a soldered part in which external electrodes 2a and 2b of a resistance chip 3 are joined with electrodes 11a and 11b on a substrate 12 by a solder 13, an interface to which a compound of Ni3 Sn4 is formed is defined as the soldered part, and the pixel (a section constituting a targeted analysis area) is extracted with the X-ray intensity 1050 cPs of Sn constituting Ni3 Sn4 as the threshold. In the extracted pixel (the targeted analysis area), the X-ray intensity of each element of Cu, Ag and Ni is measured by the EPMA mapping analysis, the mean X-ray intensity is calculated, and the mean concentration of each element is obtained from the calibration curve (the concentration conversion constant).</p> |
