发明名称 METAL ABRASIVE COMPOSITION AND POLISHING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a metal abrasive that can polish metal at a high speed. SOLUTION: [1] The metal abrasive composition comprises chelate resin particles, inorganic particles and an abrasion promoter. [2] The metal abrasive composition according to [1] wherein nitric acid or a nitrate salt is used as an abrasion promoter. [3] The metal abrasive composition according to [1] or [2] wherein the chelate resin particles are selected from the chelate resin particles including at least one atom selected from the group consisting of oxygen, nitrogen, sulfur and phosphorus atoms. And [4] a method of polishing metal by using the metal abrasion composition according to [1] through [3].</p>
申请公布号 JP2003113369(A) 申请公布日期 2003.04.18
申请号 JP20020184104 申请日期 2002.06.25
申请人 SUMITOMO CHEM CO LTD 发明人 MATSUMI YASUO;UEDA KAZUMASA
分类号 B24B57/02;B24B37/00;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 主分类号 B24B57/02
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