| 摘要 |
A measuring instrument (100) and a method for measuring features (19) on a substrate (9) are described. The measuring instrument (100) has a support element (15) that is provided opposite the substrate (9). Mounted on the support element (15) is a nonoptical measurement device (23) with which a measurement of the features (19) of the substrate (9) is performed under ambient air pressure. The nonoptical measurement device (23) can be configured, for example, as an AFM (24) or an electron beam lens (40). Furthermore, in addition to the nonoptical measurement device (23), an optical lens (10) can be provided that is used for rapid location and determination of the coarse position of features (19) on the substrate (9).
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