| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer for a chemically amplified resist having both excellent solubility in an organic solvent and good wettability with an alkali developing solution and to provide a chemically amplified resist composition having good sensitivity and dry etching resistance. SOLUTION: The polymer for a chemically amplified resist contains a monomer unit of formula (1) and a monomer unit of formula (2) and is made soluble in an aqueous alkali solution by an acid. In the formula (1), R<1> is H or methyl; R<2> is a 1-8C alkyl; m is the number of symbols R<2> and shows an integer of 0-14, and in the case of m>=2, symbols R<2> may be different from each other. In the formula (2), n1 is the number of methylene groups and shows an integer of 0-4; R<3> is a 1-4C alkyl or a functional group containing a releasable protective group; n2 is the number of symbols R<3> and shows an integer of 0 to (2n1 +2), and in the case of n2 >=2, symbols R<3> may be different from each other. |
