METHOD FOR SYNTHESIZING POLYNAPHTHYLENE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN, AND ELECTRONIC PART

摘要

PROBLEM TO BE SOLVED: To provide a method for synthesizing a polynaphthylene having a high molecular weight and excellent in heat resistance cleanly and industrially, and a positive photosensitive resin composition using the polynaphthylene.

SOLUTION: The method for synthesizing a polynaphthylene having a recurring unit represented by general formula (2) comprises a step of reacting a naphthalene derivative having a structure represented by general formula (1) in the presence of a catalyst in a liquid phase. The positive photosensitive resin composition comprises the thus-obtained polynaphthylene and a compound (B) generating an acid by light irradiation.

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