| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition containing a thermal acid generating agent and a method of forming patterns using the same. <P>SOLUTION: The resin composition contains 100 parts by weight alkali-soluble acrylic copolymer, 5 to 100 parts by weight 1,2-quinone diazide compound, 2 to 35 parts by weight nitrogen-containing crosslinking agent and 0.1 to 10 parts by weight thermal acid generating agent to generate an acid by heat. The photosensitive film patterns are manufactured by applying the photosensitive resin composition onto a base material and drying the coating to manufacture a photosensitive film, then inserting a mask of a prescribed shape and performing exposure and development. When the resulted photosensitive patterns are cured by heating, the thermally cured patterns substantially free of a heat flow are formed. <P>COPYRIGHT: (C)2003,JPO |
